Advanced Simulation Techniques for Thick Photoresist Lithography
نویسندگان
چکیده
A great deal of photolithographic activity in recent years has been centered on thick photoresist films. Thin film heads (TFH), micromachining and sensor fabrication are examples of applications requiring this type of processing. The needs of the TFH industry are currently the technology driver for thick photoresist processing. Modern TFH manufacturing processes require 1 μm resolution in layers ranging in thickness from 5 to as much as 25 μm. These large aspect ratios not only make the lithographic process difficult, but add complexity to the evaluation and measurement of experimental wafers. This is particularly true for the large number of measurements needed for process optimization and control. Well-calibrated and easy to use modeling techniques for analysis of the impact of optical system design and photoresist process changes would be extremely valuable for process lithography engineers.
منابع مشابه
Innovative SU-8 Lithography Techniques and Their Applications
SU-8 has been widely used in a variety of applications for creating structures in micro-scale as well as sub-micron scales for more than 15 years. One of the most common structures made of SU-8 is tall (up to millimeters) high-aspect-ratio (up to 100:1) 3D microstructure, which is far better than that made of any other photoresists. There has been a great deal of efforts in developing innovativ...
متن کاملThick-layer resists for surface micromachining
Interest in thick-photoresist applications is steadily growing. In addition to bump fabrication and wire interconnect technology (WIT), the process of patterning thick-layer photoresists by UV lithography is specially qualified for applications in microelectromechanical systems (MEMS). Specialized equipment and new photoresists have been developed or are under development to cope with the new c...
متن کاملAdvanced 2D Optical Lithography Simulator
exposure, photoresist bake, development and reflow. Optolith provides a fast and accurate alternative to experimental evaluation of mask printability and process control. Optolith simulates both projection imaging and proximity printing with large mask-to-resist gap. Optolith is fully interfaced to all commercial IC layout tools conforming to GDSII and CIF formats, as well as to a special propr...
متن کاملNanosphere photolithography for sub-100nm features
Microfabrication is commonly achieved via interactions of light and a photoresist (an optically sensitive material). In this process, the light is shaped into the desired pattern by a mask and projected onto the photoresist. The entire photoresist sample is then submerged within a developer, which dissolves the exposed photoresist and leaves the unexposed photoresist intact. Mask patterns can t...
متن کاملFabricating Three-Dimensional Polymeric Photonic Structures by Multi-Beam Interference Lithography
The fabrication of true three-dimensional (3D) microstructures both rapidly and economically over a large area with negligible defects is attractive for a wide range of applications. In particular, multi-beam interference lithography is one of the promising techniques that can mass-produce polymeric 3D photonic crystals defectfree over a large area. This review discusses the relationship betwee...
متن کامل